Center for Quantum Devices - Most Downloaded Journal Articles

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14.	Broadband, Tunable, and Monolithic Quantum Cascade Lasers M. Razeghi, Q. Y. Lu, N. Bandyopadhyay, W. Zhou, D. Heydari, Y. Bai, and S. Slivken. Semiconductor lasers; (140.3600) Lasers, tunable-- May 19, 2017 ...[Visit Journal] This article describes the state of research and recent developments related to broadband quantum cascade lasers. Monolithic tuning and system development is also discussed. [reprint (PDF)]
14.	InP-based quantum-dot infrared photodetectors with high quantum efficiency and high temperature imaging S. Tsao, H. Lim, H. Seo, W. Zhang and M. Razeghi IEEE Sensors Journal, Vol. 8, No. 6, p. 936-941-- June 1, 2008 ...[Visit Journal] We report a room temperature operating InAs quantum-dot infrared photodetector grown on InP substrate. The self-assembled InAs quantum dots and the device structure were grown by low-pressure metalorganic chemical vapor depositon. The detectivity was 6 x 10¹⁰cm·Hz^1/2·W^-1 at 150 K and a bias of 5 V with a peak detection wavelength around 4.0 micron and a quantum efficiency of 48%. Due to the low dark current and high responsivity, a clear photoresponse has been observed at room temperature. A 320 x 256 middle wavelength infrared focal plane array operating at temperatures up to 200 K was also demonstrated. The focal plane array had 34 mA/W responsivity, 1.1% conversion efficiency, and noise equivalent temperature difference of 344 mK at 120 K operating temperature. [reprint (PDF)]
14.	High power InAsSb/InPAsSb/InAs mid-infrared lasers A. Rybaltowski, Y. Xiao, D. Wu, B. Lane, H. Yi, H. Feng, J. Diaz, and M. Razeghi Applied Physics Letters 71 (17)-- October 27, 1997 ...[Visit Journal] We demonstrate high-power InAsSb/InPAsSb laser bars (λ ≈ 3.2 μm) consisting of three 100 μm-wide laser stripes of 700 μm cavity length, with peak output power up to 3 W at 90 K, and far-fields for the direction perpendicular to the junction as narrow as 12° full width half maximum. Spectra and far-field patterns of the laser bars are shown to have excellent characteristics for a wide range of operating conditions, suggesting the possibility of even higher light power emission with good beam quality. Joule heating is shown to be the major factor limiting higher power operation. [reprint (PDF)]
14.	Antimonide-Based Type II Superlattices: A Superior Candidate for the Third Generation of Infrared Imaging Systems M. Razeghi, A. Haddadi, A.M. Hoang, G. Chen, S. Bogdanov, S.R. Darvish, F. Callewaert, P.R. Bijjam, and R. McClintock Journal of ELECTRONIC MATERIALS, Vol. 43, No. 8, 2014-- August 1, 2014 ...[Visit Journal] Type II superlattices (T2SLs), a system of interacting multiquantum wells,were introduced by Nobel Laureate L. Esaki in the 1970s. Since then, this material system has drawn a lot of attention, especially for infrared detection and imaging. In recent years, the T2SL material system has experienced incredible improvements in material growth quality, device structure design, and device fabrication techniques that have elevated the performance of T2SL-based photodetectors and focal-plane arrays (FPAs) to a level comparable to state-of-the-art material systems for infrared detection and imaging, such as mercury cadmium telluride compounds. We present the current status of T2SL-based photodetectors and FPAs for imaging in different infrared regimes, from short wavelength to very long wavelength, and dual-band infrared detection and imaging, as well as the future outlook for this material system. [reprint (PDF)]
14.	High performance terahertz quantum cascade laser sources based on intracavity difference frequency generation Q.Y. Lu, N. Bandyopadhyay, S. Slivken, Y. Bai and M. Razeghi Optics Express, Vol. 21, No. 1, p. 968-- January 14, 2013 ...[Visit Journal] We demonstrate high power, room temperature, single-mode THz emissions based on intracavity difference frequency generation from mid-infrared quantum cascade lasers. Dual active regions both featuring giant nonlinear susceptibilities are used to enhance the THz power and conversion efficiency. The THz frequency is lithographically tuned by integrated dual-period distributed feedback gratings with different grating periods. Single mode emissions from 3.3 to 4.6 THz with side-mode suppression ratio and output power up to 40 dB and 65 µW are obtained, with a narrow linewidth of 5 GHz. [reprint (PDF)]
14.	Comparison of PLD-Grown p-NiO/n-Ga2O3 Heterojunctions on Bulk Single Crystal β-Ga2O3 and r-plane Sapphire Substrates D. J. Rogers , V. E. Sandana, F. Hosseini Teherani and M. Razeghi Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 128870J (28 January - 1 February 2024 San Francisco)doi: 10.1117/12.3012511 ...[Visit Journal] p-NiO/n-Ga2O3 heterostructures were formed on single crystal (-201) β (monoclinic) Ga2O3 and r-sapphire substrates by Pulsed Laser Deposition. Ring mesa layer stacks were created using a shadow mask during growth. X-Ray diffraction studies were consistent with the formation of (111) oriented fcc NiO on the bulk Ga2O3 and randomly oriented fcc NiO on (102) oriented β-Ga2O3 /r-sapphire. RT optical transmission studies revealed bandgap energy values of ~3.65 eV and ~5.28 eV for the NiO and Ga2O3 on r-sapphire. p-n junction devices were formed by depositing gold contacts on the layer stacks using shadow masks in a thermal evaporator. Both heterojunctions showed rectifying I/V characteristics. On bulk Ga2O, the junction showed a current density over 16mA/cm2 at +20V forward bias and a reverse bias leakage current over 3 orders of magnitude lower at -20V (1 pA). On Ga2O3/r-sapphire the forward bias current density at +15V was about an order of magnitude lower than for the p-NiO/bulk n-Ga2O3 heterojunction while the reverse bias leakage current at -15V (~ 20 pA) was an order of magnitude higher. Hence the NiO/bulk Ga2O3 junction was more rectifying. Upon illumination with a Xenon lamp a distinct increase in current was observed for the IV curves in both devices (four orders of magnitude for -15V reverse bias in the case of the p-NiO/bulk n-Ga2O3 heterojunction). The p-NiO/n-Ga2O3/rsapphire junction gave a spectral responsivity with a FWHM value of 80nm and two distinct response peaks (with maxima at 230 and 270nm) which were attributed to carriers being photogenerated in the Ga2O3 underlayer. For both devices time response studies showed a 10%/90% rise and fall of the photo generated current upon shutter open and closing which was relatively abrupt (millisecond range), and there was no evidence of significant persistent photoconductivity. [reprint (PDF)]
14.	Characteristics of Self-Assembled InGaAs/InGaP Quantum Dot Mid-Infrared Photoconductive Detectors Grown by Low Pressure MOCVD S. Kim, M. Erdtmann, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the first self-assembled InGaAs/InGaP quantum dot intersubband infrared photoconductive detectors (QDIPs) grown on semi-insulating GaAs substrate by low pressure metal organic chemical vapor deposition (MOCVD). The InGaAs quantum dots were constructed on an InGaP matrix as self assembling in Stranski-Krastanow growth mode in optimum growth conditions. The detector structure was prepared for single layer and multi-stacked quantum dots for active region. Normal incident photoconductive response was observed at a peak wavelength of 5.5 μm with a high responsivity of 130 mA/W, and a detectivity of 4.74 X 10⁷ cm·Hz^½/W at 77 K for multi-stack QDIP. Low temperature photoresponse of the single quantum dot photodetector was characterized. Peak response was obtained between 16 K and 60 K. The detailed dark current noise measurements were carried on single and multistack quantum dot infrared detectors. High photoconductive gain as 7.6 x 10³ biased at 0.5 V results in increasing the intersubband carrier relaxation time as two order of magnitude compared quantum well infrared photodetectors. [reprint (PDF)]
14.	Novel Sb-based Alloys for Uncooled Infrared Photodetector Applications M. Razeghi SPIE Conference, San Jose, CA, -- January 22, 2001 ...[Visit Journal] We report on the growth and characterization of InSbBi, InTlSb, InTlP, and the quaternary alloys for uncooled long- wavelength infrared photodetector applications. The layers were grown on InSb and GaAs substrates by low-pressure metalorganic chemical vapor deposition. The incorporation of Bi and Tl in InSb was investigated with high-resolution x-ray diffraction, energy dispersive x-ray analysis, and optical photoresponse measurements. We also demonstrate the photodetectors fabricated from the grown InSbBi and InTlSb alloys. InSb_0.96Bi_0.04 photoconductive detectors exhibited a responsivity of 3.2 V/W at 77 K. The estimated Johnson noise limited detectivityat 7 micrometers was 1.7 X 10⁸ cm·Hz^½/W at 77 K. A room temperature operating InSb_0.95Bi_0.05 photodetector was also demonstrated.Photoresponse up to 12 micrometers was achieved at 300 K. The responsivity and Johnson noise-limited detectivity at 10.6 μm were 1.9 mV/W and 1.2 X 10⁶ cm·Hz^½/W, respectively. Photoresponse up to 15 μm was achieved at 300 K from quaternary InTlAsSb and InBiAsSb alloys. [reprint (PDF)]
14.	Resonant cavity enhanced heterojunction phototransistors based on type-II superlattices Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics & Technology Available online 27 October 2020, 103552 https://doi.org/10.1016/j.infrared.2020.103552-- October 27, 2020 ...[Visit Journal] Resonant cavity enhanced heterojunction phototransistor based on InAs/GaSb/AlSb type-II superlattice grown by molecular beam epitaxy has been demonstrated. The resonant wavelength was designed to be at near 1.9 μm wavelength range at room temperature. An eleven-pair lattice matched GaSb-AlAsSb quarter-wavelength Bragg reflector was used in the RCE-HPT to enhance the photoresponse. The device showed the wavelength selectivity and a cavity enhancement of the responsivity at 1.9 μm at room temperature. [reprint (PDF)]
14.	Antimonite-based gap-engineered type-II superlattice materials grown by MBE and MOCVD for the third generation of infrared imagers Manijeh Razeghi, Arash Dehzangi, Donghai Wu, Ryan McClintock, Yiyun Zhang, Quentin Durlin, Jiakai Li, Fanfei Meng Proc. SPIE Defense + Commercial Sensing,Infrared Technology and Applications XLV, 110020G -- May 7, 2019 ...[Visit Journal] Third generation of infrared imagers demand performances for higher detectivity, higher operating temperature, higher resolution, and multi-color detection all accomplished with better yield and lower manufacturing costs. Antimonidebased gap-engineered Type-II superlattices (T2SLs) material system is considered as a potential alternative for MercuryCadmium-Telluride (HgCdTe) technology in all different infrared detection regimes from short to very long wavelengths for the third generation of infrared imagers. This is due to the incredible growth in the understanding of its material properties and improvement of device processing which leads to design and fabrication of better devices. We will present the most recent research results on Antimonide-based gap-engineered Type-II superlattices, such as highperformance dual-band SWIR/MWIR photo-detectors and focal plane arrays for different infrared regimes, toward the third generation of infrared imaging systems at the Center for Zuantum Devices. Comparing metal-organic chemical vapor deposition (MOCVD), vs molecular beam epitaxy (MBE). [reprint (PDF)]
14.	Fabrication of nanostructured heterojunction LEDs using self-forming Moth-Eye Arrays of n-ZnO Nanocones Grown on p-Si (111) by PLD D.J. Rogers; V.E. Sandana; F. Hosseini Teherani; M. Razeghi; H.-J. Drouhin Proc. SPIE 7217, Zinc Oxide Materials and Devices IV, 721708 (February 17, 2009)-- February 17, 2009 ...[Visit Journal] ZnO nanostructures were grown on Si (111) substrates using Pulsed Laser Deposition. The impact of growth temperature (T_s) and Ar pressure (P_Ar) on the morphology, crystal structure and photoluminescence was investigated. Various types of ZnO nanostructures were obtained. Self-forming arrays of vertically-aligned nanorods and nanocones with strong c-axis crystallographic orientation and good optical response were obtained at higher T_s. The nanocone, or "moth-eye" type structures were selected for LED development because of their graded effective refractive index, which could facilitate improved light extraction at the LED/air interface. Such moth-eye arrays were grown on p-type Si (111) substrates to form heteroj unction LEDs with the n-type ZnO nanocones acting as an active component of the device. These nanostructured LEDs gave rectifying I/V characteristics with a threshold voltage of about 6V and a blueish-white electroluminescence, which was clearly visible to the naked eye. [reprint (PDF)]
14.	Fabrication and characterization of novel hybrid green light emitting didoes based on substituting n-type ZnO for n-type GaN in an inverted p-n junction C. Bayram, D. Rogers, F. H. Teherani, and M. Razeghi Journal of Vacuum Science and Technology B, Vol. 27, No. 3, May/June, p. 1784-1788-- May 29, 2009 ...[Visit Journal] Details of the fabrication and characterization of hybrid green light emitting diodes, composed of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN on AlN/sapphire, are reported. Scanning electron microscope, atomic force microscopy, high resolution x-ray diffraction, and photoluminescence were used to study the hybrid device. The effects of solvents, annealing, and etching on n-ZnO are discussed. Successful hybridization of ZnO and (In)GaN into a green light emitting diode was realized. [reprint (PDF)]
14.	Comparison of Trimethylgallium and Triethylgallium for the Growth of GaN A. Saxler, D. Walker, P. Kung, X. Zhang, M. Razeghi, J. Solomon, W. Mitchel, and H.R. Vydyanath Applied Physics Letters 71 (22)-- December 1, 1997 ...[Visit Journal] GaN films grown by low-pressure metalorganic chemical vapor deposition using trimethylgallium and triethylgallium as gallium precursors are compared. The films were characterized by x-ray diffraction, Hall effect, photoluminescence, secondary ion mass spectroscopy, and etch pit density measurements. GaN layers grown using triethylgallium exhibited superior electrical and optical properties and a lower carbon impurity concentration. [reprint (PDF)]
13.	Room temperature neagtive differential resistance characteristics of polar III-nitride resonant tunneling diodes C. Bayram, Z. Vashaei, and M. Razeghi Applied Physics Letters, Vol. 97, No. 9, p. 092104-1-- August 30, 2010 ...[Visit Journal] III-nitride resonant tunneling diodes (RTDs), consisting Al_0.2Ga_0.8N/GaN double-barrier (DB) active layers, were grown on c-plane lateral epitaxial overgrowth (LEO) GaN/sapphire and c-plane freestanding (FS) GaN. RTDs on both templates, fabricated into mesa diameters ranging from 5 to 35 μm, showed negative differential resistance (NDR) at room temperature. NDR characteristics (voltage and current density at NDR onset and current-peak-to-valley ratio) were analyzed and reported as a function of device size and substrate choice. Our results show that LEO RTDs perform as well as FS ones and DB active layer design and quality have been the bottlenecks in III-nitride RTDs. [reprint (PDF)]
13.	Growth of “moth-eye” ZnO nanostructures on Si(111), c-Al2O3, ZnO and steel substrates by pulsed laser deposition Vinod E. Sandana, David J. Rogers, Ferechteh Hosseini Teherani, Philippe Bove, Michael Molinari, Michel Troyon, Alain Largeteau, Gérard Demazeau, Colin Scott, Gaelle Orsal, Henri-Jean Drouhin, Abdallah Ougazzaden, Manijeh Razeghi Phys. Status Solidi C., 1-5 (2013)-- August 6, 2013 ...[Visit Journal] Self-forming, vertically-aligned, arrays of black-body-like ZnO moth-eye nanostructures were grown on Si(111), c-Al₂O₃, ZnO and high manganese austenitic steel substrates using Pulsed Laser Deposition. X-ray diffraction (XRD) revealed the nanostructures to be well-crystallised wurtzite ZnO with strong preferential c-axis crystallographic orientation along the growth direction for all the substrates. Cathodoluminescence (CL) studies revealed emission characteristic of the ZnO near band edge for all substrates. Such moth-eye nanostructures have a graded effective refractive index and exhibit black-body characteristics. Coatings with these features may offer improvements in photovoltaic and LED performance. Moreover, since ZnO nanostructures can be grown readily on a wide range of substrates it is suggested that such an approach could facilitate growth of GaN-based devices on mismatched and/or technologically important substrates, which may have been inaccessible till present. [reprint (PDF)]
13.	High-temperature high-power continuous-wave operation of buried heterostructure quantum-cascade lasers A. Evans, J.S. Yu, J. David, L. Doris, K. Mi, S. Slivken, and M. Razeghi Applied Physics Letters, 84 (3)-- January 19, 2004 ...[Visit Journal] We report cw operation of buried heterostructure quantum-cascade lasers (λ=6 µm) using a thick electroplated Au top contact layer and epilayer-up bonding on a copper heat sink up to a temperature of 333 K (60 °C). The high cw optical output powers of 446 mW at 293 K, 372 mW at 298 K, and 30 mW at 333 K are achieved with threshold current densities of 2.19, 2.35, and 4.29 kA/cm² respectively, for a high-reflectivity-coated, 9-µm-wide and 3-mm-long laser [reprint (PDF)]
13.	Growth of Al_xGa_1-xN:Ge on sapphire and silicon substrates X. Zhang, P. Kung, A. Saxler, D. Walker, T.C. Wang, and M. Razeghi Applied Physics Letters 67 (12)-- September 18, 1995 ...[Visit Journal] Al_xGa_1–xN were grown on (00.1) sapphire and (111) silicon substrates in the whole composition range (0 <= x <= 1). The high optical quality of the epilayers was assessed by room-temperature optical absorption and photoluminescence measurements. Layers with higher Al composition are more resistive. Resistive Al_xGa_1–xN epilayers were successfully doped with Ge and free-electron concentration as high as 3 × 10¹⁹ cm^–3 was achieved. [reprint (PDF)]
13.	8-13 μm InAsSb heterojunction photodiode operating at near room temperature J.D. Kim, S. Kim, D. Wu, J. Wojkowski, J. Xu, J. Piotrowski, E. Bigan, and M. Razeghi Applied Physics Letters 67 (18)-- October 30, 1995 ...[Visit Journal] p⁺-InSb/π-InAs_1−xSb_x/n⁺-InSb heterojunction photodiodes operating at near room temperature in the 8–13 μm region of infrared (IR) spectrum are reported. A room‐temperature photovoltaic response of up to 13 μm has been observed at 300 K with an x≊0.85 sample. The voltage responsivity‐area product of 3×10⁻⁵ V· cm²/W has been obtained at 300 K for the λ=10.6 μm optimized device. This was close to the theoretical limit set by the Auger mechanism, with a detectivity at room temperature of ≊1.5×10⁸ cm ·Hz^½/W. [reprint (PDF)]
13.	GaN avalanche photodiodes grown on m-plane freestanding GaN substrate Z. Vashaei, E. Cicek, C. Bayram, R. McClintock and M. Razeghi Applied Physics Letters, Vol. 96, No. 20, p. 201908-1-- May 17, 2010 ...[Visit Journal] M-plane GaN avalanche p-i-n photodiodes on low dislocation density freestanding m-plane GaN substrates were realized using metal-organic chemical vapor deposition. High quality homoepitaxial m-plane GaN layers were developed; the root-mean-square surface roughness was less than 1 Å and the full-width-at-half-maximum value of the x-ray rocking curve for (1010) diffraction of m-plane GaN epilayer was 32 arcsec. High quality material led to a low reverse-bias dark current of 8.11 pA for 225 μm² mesa photodetectors prior to avalanche breakdown, with the maximum multiplication gain reaching about 8000. [reprint (PDF)]
13.	Fabrication of GaN nanotubular material using MOCVD with aluminum oxide membrane W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270K-- January 23, 2006 ...[Visit Journal] GaN nanotubular material is fabricated with aluminum oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminum oxide membrane with ordered nano holes is used as template. Gallium nitride is deposited at the inner wall of the nano holes in aluminum oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis condition in MOCVD is obtained successfully for the gallium nitride nanotubular material in this research. The diameter of GaN nanotube fabricated is approximately 200 ~ 250 nm and the wall thickness is about 40 ~ 50 nm. GaN nanotubular material consists of numerous fine GaN particulates with sizes ranging 15 to 30 nm. [reprint (PDF)]
13.	Quantum Dot Infrared Photodetectors: Comparison Experiment and Theory H. Lim, W. Zhang, S. Tsao, T. Sills, J. Szafraniec, K. Mi, B. Movaghar, and M. Razeghi Virtual Journal of Nanoscale Science and Technology 12 (9)-- August 29, 2005 ...[Visit Journal][reprint (PDF)]
13.	Thermal stability of GaN thin films grown on (0001) Al₂O₃, (0112) Al₂O₃ and (0001)Si 6H-SiC substrates C.J. Sun, P. Kung, A. Saxler, H. Ohsato, E. Bigan, M. Razeghi, and D.K. Gaskill Journal of Applied Physics 76 (1)-- July 1, 1994 ...[Visit Journal] Single crystals of GaN were grown on (0001), (0112) Al₂O₃ and (0001)Si 6H‐SiC substrates using an atmospheric pressure metalorganic chemical‐vapor‐deposition reactor. The relationship has been studied between the thermal stability of the GaN films and the substrate’s surface polarity. It appeared that the N‐terminated (0001) GaN surface grown on (0001)Si 6H‐SiC has the most stable surface, followed by the nonpolar (1120) GaN surface grown on (0112) Al₂O₃, while the Ga‐terminated (0001) GaN surface grown on (0001) Al₂O₃ has the least stable surface. This is explained with the difference in the atomic configuration of each of these surfaces which induces a difference in their thermal decomposition. [reprint (PDF)]
13.	Cubic Phase GaN on Nano-grooved Si (100) via Maskless Selective Area Epitaxy Bayram, C., Ott, J. A., Shiu, K.-T., Cheng, C.-W., Zhu, Y., Kim, J., Razeghi, M. and Sadana, D. K. Adv. Funct. Mater. 2014-- April 1, 2014 ...[Visit Journal] A method of forming cubic phase (zinc blende) GaN (referred as c-GaN) on a CMOS-compatible on-axis Si (100) substrate is reported. Conventional GaN materials are hexagonal phase (wurtzite) (referred as h-GaN) and possess very high polarization fields (∼MV/cm) along the common growth direction of <0001>. Such large polarization fields lead to undesired shifts (e.g., wavelength and current) in the performance of photonic and vertical transport electronic devices. The cubic phase of GaN materials is polarization-free along the common growth direction of <001>, however, this phase is thermodynamically unstable, requiring low-temperature deposition conditions and unconventional substrates (e.g., GaAs). Here, novel nano-groove patterning and maskless selective area epitaxy processes are employed to integrate thermodynamically stable, stress-free, and low-defectivity c-GaN on CMOS-compatible on-axis Si. These results suggest that epitaxial growth conditions and nano-groove pattern parameters are critical to obtain such high quality c-GaN. InGaN/GaN multi-quantum-well structures grown on c-GaN/Si (100) show strong room temperature luminescence in the visible spectrum, promising visible emitter applications for this technology. [reprint (PDF)]
13.	Highly Conductive Co-Doped Ga2O3Si-In Grown by MOCVD Junhee Lee, Honghyuk Kim, Lakshay Gautam and Manijeh Razeghi Coatings 2021, 11(3), 287; https://doi.org/10.3390/coatings11030287 ...[Visit Journal] We report a highly conductive gallium oxide doped with both silicon and indium grown on c-plane sapphire substrate by MOCVD. From a superlattice structure of indium oxide and gallium oxide doped with silicon, we obtained a highly conductive material with an electron hall mobility up to 150 cm2/V·s with the carrier concentration near 2 × 1017 cm−3. However, if not doped with silicon, both Ga2O3:In and Ga2O3 are highly resistive. Optical and structural characterization techniques such as X-ray, transmission electron microscope, and photoluminescence, reveal no significant incorporation of indium into the superlattice materials, which suggests the indium plays a role of a surfactant passivating electron trapping defect levels. [reprint (PDF)]
13.	Pulsed metal-organic chemical vapor deposition of high quality AlN/GaN superlattices for near-infrared intersubband transitions C. Bayram, N. Pere-Laperne, R. McClintock, B. Fain and M. Razeghi Applied Physics Letters, Vol. 94, No. 12, p. 121902-1-- March 23, 2009 ...[Visit Journal] A pulsed metal-organic chemical vapor deposition technique is developed for the growth of high-quality AlN/GaN superlattices (SLs) with intersubband (ISB) transitions at optical communications wavelengths. Tunability of the AlN and GaN layers is demonstrated. Indium is shown to improve SL surface and structural quality. Capping thickness is shown to be crucial for ISB transition characteristics. Effects of barrier- and well-doping on the ISB absorption are reported. [reprint (PDF)]

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