Center for Quantum Devices - Most Downloaded Journal Articles

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15.	Type–II superlattices base visible/extended short–wavelength infrared photodetectors with a bandstructure–engineered photo–generated carrier extractor Arash Dehzangi, Ryan McClintock, Abbas Haddadi, Donghai Wu, Romain Chevallier, Manijeh Razeghi Scientific Reports volume 9, Article number: 5003 -- March 21, 2019 ...[Visit Journal] Visible/extended short–wavelength infrared photodetectors with a bandstructure–engineered photo–generated carrier extractor based on type–II InAs/AlSb/GaSb superlattices have been demonstrated. The photodetectors are designed to have a 100% cut-off wavelength of ~2.4 μm at 300K, with sensitivity down to visible wavelengths. The photodetectors exhibit room–temperature (300K) peak responsivity of 0.6 A/W at ~1.7 μm, corresponding to a quantum efficiency of 43% at zero bias under front–side illumination, without any anti–reflection coating where the visible cut−on wavelength of the devices is <0.5 µm. With a dark current density of 5.3 × 10⁻⁴ A/cm² under −20 mV applied bias at 300K, the photodetectors exhibit a specific detectivity of 4.72 × 10¹⁰ cm·Hz^½W^-1. At 150K, the photodetectors exhibit a dark current density of 1.8 × 10⁻¹⁰ A/cm² and a quantum efficiency of 40%, resulting in a detectivity of 5.56 × 10¹³ cm·Hz^½/W [reprint (PDF)]
15.	InAs/InAs_1-xSb_x type-II superlattices for high performance long wavelength infrared detection A. Haddadi , G. Chen , R. Chevallier , A. M. Hoang , and M. Razeghi Appl. Phys. Lett. 105, 121104 (2014)-- September 22, 2014 ...[Visit Journal] High performance long-wavelength infrared nBn photodetectors based on InAs/InAs_1−xSb_x type-II superlattices on GaSb substrate have been demonstrated. The photodetector's 50% cut-off wavelength was ∼10 μm at 77 K. The photodetector with a 6 μm-thick absorption region exhibited a peak responsivity of 4.47 A/W at 7.9 μm, corresponding to a quantum efficiency of 54% at −90 mV bias voltage under front-side illumination and without any anti-reflection coating. With an R × A of 119 Ω·cm² and a dark current density of 4.4 × 10⁻⁴ A/cm² under −90 mV applied bias at 77 K, the photodetector exhibited a specific detectivity of 2.8 × 10¹¹ cm·Hz^1/2·W^-1. [reprint (PDF)]
15.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
15.	High-Performance Focal Plane Arrays Based on InAs-GaSb Superlattices with a 10-micron Cutoff Wavelegth P.Y. Delaunay, B.M. Nguyen, D. Hoffman and M. Razeghi IEEE Journal of Quantum Electronics, Vol. 44, No. 5, p. 462-467-- May 1, 2008 ...[Visit Journal] We report on the demonstration of a focal plane array based on Type-II InAs/GaSb superlattices grown on N-type GaSb substrate with a 50%-cutoff wavelength at 10 μm. The surface leakage occurring after flip-chip bonding and underfill in the Type-II devices was suppressed using a double heterostructure design. The R₀A of diodes passivated with SiO₂ was 23 Ω·cm² after underfill. A focal plane array hybridized to an Indigo readout integrated circuit demonstrated a noise equivalent temperature difference of 33 mK at 81 K, with an integration time of 0.23 ms. [reprint (PDF)]
15.	Sampled grating, distributed feedback quantum cascade lasers with broad tunability and continuous operation at room temperature S. Slivken, N. Bandyopadhyay, S. Tsao, S. Nida, Y. Bai, Q.Y. Lu and M. Razeghi Applied Physics Letters, Vol. 100, No. 26, p. 261112-1-- June 25, 2012 ...[Visit Journal] A dual-section, single-mode quantum cascade laser is demonstrated in continuous wave at room temperature with up to 114 nm (50 cm⁻¹) of tuning near a wavelength of 4.8 μm. Power above 100 mW is demonstrated, with a mean side mode suppression ratio of 24 dB. By changing the grating period, 270 nm (120 cm⁻¹) of gap-free electrical tuning for a single gain medium has been realized. [reprint (PDF)]
15.	Structural, Optical, Electrical and Morphological Study of Transparent p-NiO/n-ZnO Heterojunctions Grown by PLD V. E. Sandana, D. J. Rogers, F. Hosseini Teherani, P. Bove, N. Ben Sedrine, M. R. Correia, T. Monteiro, R. McClintock, and M. Razeghi Proc. SPIE 9364, Oxide-based Materials and Devices VI, 93641O-- March 24, 2015 ...[Visit Journal] NiO/ZnO heterostructures were fabricated on FTO/glass and bulk hydrothermal ZnO substrates by pulsed laser deposition. X-Ray diffraction and Room Temperature (RT) Raman studies were consistent with the formation of (0002) oriented wurtzite ZnO and (111) oriented fcc NiO. RT optical transmission studies revealed bandgap energy values of ~3.70 eV and ~3.30 eV for NiO and ZnO, respectively and more than 80% transmission for the whole ZnO/NiO/FTO/glass stack over the majority of the visible spectrum. Lateral p-n heterojunction mesas (~6mm x 6mm) were fabricated using a shadow mask during PLD growth. n-n and p-p measurements showed that Ti/Au contacting gave an Ohmic reponse for the NiO, ZnO and FTO. Both heterojunctions had rectifying I/V characteristics. The junction on FTO/glass gave forward bias currents (243mA at +10V) that were over 5 orders of magnitude higher than those for the junction formed on bulk ZnO. At ~ 10^-7 A (for 10V of reverse bias) the heterojunction leakage current was approximately two orders of magnitude lower on the bulk ZnO substrate than on FTO. Overall, the lateral p-NiO/n-ZnO/FTO/glass device proved far superior to that formed by growing p-NiO directly on the bulk n-ZnO substrate and gave a combination of electrical performance and visible wavelength transparency that could predispose it for use in various third generation transparent electronics applications. [reprint (PDF)]
15.	High Frequency Extended Short-Wavelength Infrared Heterojunction Photodetectors Based on InAs/GaSb/AlSb Type-II Superlattices Romain Chevallier, Abbas Haddadi, Ryan McClintock, Arash Dehzangi , Victor Lopez-Dominguez, Pedram Khalili Amiri, Manijeh Razeghi IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 6-- December 1, 2018 ...[Visit Journal] InAs/GaSb/AlSb type-II superlattice-based photodetectors, with 50% cut-off wavelength of 2.1 µm and a −3 dB cut-off frequency of 4.8 GHz, are demonstrated, for 10 µm diameter circular mesas under 15 V applied reverse bias. A study of the cut-off frequency with applied bias and mesa size was performed to evaluate some of the limiting factors of photodetectors high frequency performance. [reprint (PDF)]
15.	High power, low divergent, substrate emitting quantum cascade ring laser in continuous wave operation D. H. Wu and M. Razeghi APL Materials 5, 035505-- March 21, 2017 ...[Visit Journal] We demonstrate a surface grating coupled substrate emitting quantum cascade ring laser with high power room temperature continuous wave operation at 4.64 μm μm . A second order surface metal/semiconductor distributed-feedback grating is used for in-plane feedback and vertical out-coupling. A device with 400 μm μm radius ring cavity exhibits an output power of 202 mW in room temperature continuous wave operation. Single mode operation with a side mode suppression ratio of 25 dB is obtained along with a good linear tuning with temperature. The far field measurement exhibits a low divergent concentric ring beam pattern with a lobe separation of ∼0.34°, which indicates that the device operates in fundamental mode (n = 1). [reprint (PDF)]
15.	Solar-blind photodetectors based on Ga₂O₃ and III-nitrides Ryan McClintock; Alexandre Jaud; Lakshay Gautam; Manijeh Razeghi Proc. SPIE 11288, Quantum Sensing and Nano Electronics and Photonics XVII, 1128803-- January 31, 2020 ...[Visit Journal] Recently, there has been a surge of interest in the wide bandgap semiconductors for solar blind photo detectors (SBPD). This work presents our recent progress in the growth/doping of AlGaN and Ga₂O₃ thin films for solar blind detection applications. Both of these thin films grown are grown by metal organic chemical vapor deposition (MOCVD) in the same Aixtron MOCVD system. Solar-blind metal-semiconductor-metal photodetectors were fabricated with Ga₂O₃. Spectral responsivity studies of the MSM photodetectors revealed a peak at 261 nm and a maximum EQE of 41.7% for a −2.5 V bias. We have also demonstrated AlGaN based solar-blind avalanche photodiodes with a gain in excess of 57,000 at ~100 volts of reverse bias. This gain can be attributed to avalanche multiplication of the photogenerated carriers within the device. Both of these devices show the potential of wide bandgap semiconductors for solar blind photo detectors. [reprint (PDF)]
15.	Recent advances in InAs/InAs1- xSbx/AlAs1-xSbx gap-engineered Type-II superlattice-based photodetectors Manijeh Razeghi, Abbas Haddadi, Arash Dehzangi, Romain Chevallier, Thomas Yang Proc. SPIE 10177, Infrared Technology and Applications XLIII, 1017705 -- May 9, 2017 ...[Visit Journal] InAs/InAs1-xSbx/AlAs1-xSbx type-II superlattices (T2SLs) is a system of multi-interacting quantum wells. Since its introduction, this material system has drawn a lot of attention especially for infrared detection. In recent years, InAs/InAs1- xSbx/AlAs1-xSbx T2SL material system has experienced incredible improvements in material quality, device structure designs and device fabrication process which elevated the performances of T2SL-based photodetectors to a comparable level to the state-of-the-art material systems for infrared detection such as Mercury Cadmium Telluride (MCT). In this paper, we will present the current status of InAs/InAs1-xSbx/AlAs1-xSbx T2SL-based photodetectors for detection in different infrared regions, from short-wavelength (SWIR) to long-wavelength (LWIR) infrared, and the future outlook of this material system. [reprint (PDF)]
14.	MOCVD grown β-Ga₂O₃ metal-oxide-semiconductor field effect transistors on sapphire Ji-Hyeon Park , Ryan McClintock, Alexandre Jaud, Arash Dehzangi , Manijeh Razeghi Applied Physics Express 12, 095503-- August 28, 2019 ...[Visit Journal] We fabricated β-Ga₂O₃:Si metal-oxide field-effect transistors (MOSFETs) on c-plane sapphire substrates which typically showed maximum drain current of 100 mA·mm⁻¹. β-Ga₂O₃:Si thin films were realized on c-plane sapphire substrates through a combination of metalorganic chemical vapor deposition and post-annealing. The MOSFET device presented excellent on/off drain current ratio of ∼10¹¹ with very low gate leakage current, sharp pinch off behavior, and a breakdown voltage of 400 V at VG = −40 V. The growth and fabrication of β-Ga₂O₃:Si MOSFETs on c-plane sapphire is valuable to its demonstration of the great potential for future high-power electronic devices. [reprint (PDF)]
14.	Sb-based infrared materials and photodetectors for the 3-5 and 8-12 μm range E. Michel, J.D. Kim, S. Park, J. Xu, I. Ferguson, and M. Razeghi SPIE Photonics West '96 'Photodetectors: Materials and Devices'; Proceedings 2685-- January 27, 1996 ...[Visit Journal] In this paper, we report on the growth of InSb on (100) Si and (111)B GaAs substrates and the growth of InAsSb alloys for longer wavelength applications. The fabrication and characterization of photodetectors based on these materials are also reported. Both photoconductive and photovoltaic devices are investigated. The photodiodes are InSb p-i-n structures and InSb/InAs_1-xSb_x/InSb double heterostructures grown on (100) and (111)B semi-insulating GaAs and Si substrates by low pressure metalorganic chemical vapor deposition and solid source molecular beam epitaxy. The material parameters for device structures have been optimized through theoretical calculations based on fundamental mechanisms. InSb p-i-n photodiodes with peak responsivities approximately 103 V/W were grown on Si and (111) GaAs substrates. An InAsSb photovoltaic detector with a composition of x equals 0.85 showed photoresponse up to 13 micrometers at 300 K with a peak responsivity of 9.13 X 10^-2 V/W at 8 micrometers . The R₀A product of InAsSb detectors has been theoretically and experimentally analyzed. [reprint (PDF)]
14.	Comparison of Trimethylgallium and Triethylgallium for the Growth of GaN A. Saxler, D. Walker, P. Kung, X. Zhang, M. Razeghi, J. Solomon, W. Mitchel, and H.R. Vydyanath Applied Physics Letters 71 (22)-- December 1, 1997 ...[Visit Journal] GaN films grown by low-pressure metalorganic chemical vapor deposition using trimethylgallium and triethylgallium as gallium precursors are compared. The films were characterized by x-ray diffraction, Hall effect, photoluminescence, secondary ion mass spectroscopy, and etch pit density measurements. GaN layers grown using triethylgallium exhibited superior electrical and optical properties and a lower carbon impurity concentration. [reprint (PDF)]
14.	InAsSbP/InAsSb/InAs Laser Diodes λ = 3.2 μm) Grown by Low-Pressure Metalorganic Chemical Vapor Deposition J. Diaz, G. Lukas, D. Wu, S. Kim, M. Erdtmann, E. Kaas, and M. Razeghi Applied Physics Letters 70 (1)-- January 6, 1997 ...[Visit Journal] We report metal–organic chemical-vapor deposition-grown double heterostructure InAsSbP/InAsSb/InAs diode lasers emitting at 3.2 μm operating at temperatures up to 220 K with threshold current density of 40 A/cm² at 77 K and characteristic temperature up to 42 K. Output powers as high as 260 mW in pulse mode and 60 mW in continuous wave operation have been obtained from an uncoated 100 μm stripe-width broad-area laser at 77 K. Comparison with theory shows that there is no significant nonradiative recombination mechanism for these lasers at 77 K. [reprint (PDF)]
14.	Highly Conductive Co-Doped Ga2O3Si-In Grown by MOCVD Junhee Lee, Honghyuk Kim, Lakshay Gautam and Manijeh Razeghi Coatings 2021, 11(3), 287; https://doi.org/10.3390/coatings11030287 ...[Visit Journal] We report a highly conductive gallium oxide doped with both silicon and indium grown on c-plane sapphire substrate by MOCVD. From a superlattice structure of indium oxide and gallium oxide doped with silicon, we obtained a highly conductive material with an electron hall mobility up to 150 cm2/V·s with the carrier concentration near 2 × 1017 cm−3. However, if not doped with silicon, both Ga2O3:In and Ga2O3 are highly resistive. Optical and structural characterization techniques such as X-ray, transmission electron microscope, and photoluminescence, reveal no significant incorporation of indium into the superlattice materials, which suggests the indium plays a role of a surfactant passivating electron trapping defect levels. [reprint (PDF)]
14.	High-performance short-wavelength infrared photodetectors based on type-II InAs/InAs1-xSbx/AlAs1-xSbx superlattices A. Haddadi, X.V. Suo, S. Adhikary, P. Dianat, R. Chevallier, A.M. Hoang, and M. Razeghi Applied Physics Letters 107 , 141104-- October 5, 2015 ...[Visit Journal] A high-performance short-wavelength infrared n-i-p photodiode based on InAs/InAs1-xSbx/AlAs1-xSbx type-II superlattices on GaSb substrate has been demonstrated. The device is designed to have a 50% cut-off wavelength of ~1.8μm at 300K. The photodetector exhibited a room-temperature (300 K) peak responsivity of 0.47 A/W at 1.6μm, corresponding to a quantum efficiency of 37% at zero bias under front-side illumination, without any anti-reflection coating. With an R×A of 285 Ω·cm² and a dark current density of 9.6×10^-5 A/cm² under −50mV applied bias at 300 K, the photodiode exhibited a specific detectivity of 6.45×10¹⁰ cm·Hz^½/W. At 200 K, the photodiode exhibited a dark current density of 1.3×10^-8 A/cm² and a quantum efficiency of 36%, resulting in a detectivity of 5.66×10¹² cm·Hz^½/W. [reprint (PDF)]
14.	Electrical Characterization of Al_xGa_1-xN for UV Photodetector Applications A. Saxler, M. Ahoujja, W.C. Mitchel, P. Kung, D. Walker, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] Ultraviolet photodetectors have many military and commercial applications. However, for many of these applications, the photodetectors must be solar blind. This means that the photodetectors must have a cutoff wavelength of less than about 270 nm. Semiconductor based devices would then need energy gaps of over 4.6 eV. In the Al_xGa_1-xN system, the aluminum mole fraction, x, required is over 40%. As the energy gap is increased, doping becomes much more difficult, especially p-type doping. This report is a study of the electrical properties of Al_xGa_1-xN to enable better control of the doping. Magnesium doped p-type Al_xGa_1-xN has been studied using high-temperature Hall effect measurements. The acceptor ionization energy has been found to increase substantially with the aluminum content. Short-period superlattices consisting of alternating layers of GaN:Mg and AlGaN:Mg were also grown by low-pressure organometallic vapor phase epitaxy. The electrical properties of these superlattices were measured as a function of temperature and compared to conventional AlGaN:Mg layers. It is shown that the optical absorption edge can be shifted to shorter wavelengths while lowering the acceptor ionization energy by using short- period superlattice structures instead of bulk-like AlGaN:Mg. Silicon doped n-type films have also been studied. [reprint (PDF)]
14.	Low Dark Current Deep UV AlGaN Photodetectors on AlN Substrate Lakshay Gautam, Junhee Lee, Gail Brown, Manijeh Razeghi IEEE Journal of Quantum Electronics, vol. 58, no. 3, pp. 1-5, June 2022, Art no. 4000205 ...[Visit Journal] We report high quality, low dark current, deep Ultraviolet AlGaN/AlN Photodetectors on AlN substrate. AlGaN based Photodetectors are grown and fabricated both on AlN and Sapphire substrates with the same epilayer structure. Subsequently, electrical characteristics of both photodetectors on AlN substrate and Sapphire are compared. A reduction of 4 orders of magnitude of dark current density is reported in UV detectors grown on AlN substrate with respect to Sapphire substrate. [reprint (PDF)]
14.	Type-II Antimonide-based Superlattices for the Third Generation Infrared Focal Plane Arrays Manijeh Razeghi, Edward Kwei-wei Huang, Binh-Minh Nguyen, Siamak Abdollahi Pour, and Pierre-Yves Delaunay SPIE Proceedings, Infrared Technology and Applications XXXVI, Vol. 7660, pp. 76601F-- May 10, 2010 ...[Visit Journal] In recent years, the Type-II superlattice (T2SL) material platform has seen incredible growth in the understanding of its material properties which has lead to unprecedented development in the arena of device design. Its versatility in band-structure engineering is perhaps one of the greatest hallmarks of the T2SL that other material platforms are lacking. In this paper, we discuss advantages of the T2SL, specifically the M-structure T2SL, which incorporates AlSb in the traditional InAs/GaSb superlattice. Using the M-structure, we present a new unipolar minority electron detector coined as the p-M-p, the letters which describe the composition of the device. Demonstration of this device structure with a 14 μm cutoff attained a detectivity of 4x10¹⁰ Jones (-50 mV) at 77 K. As device performance improves year after year with novel design contributions from the many researchers in this field, the natural progression in further enabling the ubiquitous use of this technology is to reduce cost and support the fabrication of large infrared imagers. In this paper, we also discuss the use of GaAs substrates as an enabling technology for third generation imaging on T2SLs. Despite the 7.8% lattice mismatch between the native GaSb and alternative GaAs substrates, T2SL photodiodes grown on GaAs at the MWIR and LWIR have been demonstrated at an operating temperature of 77 K [reprint (PDF)]
14.	Monolithic Integration of GaInAs/InP Quantum Well Infrared Photodetectors on Si Substrate M. Erdtmann and M. Razeghi SPIE Conference, San Jose, CA, -- January 22, 2001 ...[Visit Journal] Using low-pressure metalorganic chemical vapor deposition, we have grown GaInAs/InP QWIP structures on GaAs-coated Si substrate. First, the procedure to optimize the epitaxy of the InP buffer layer on Si substrate is given. Excellent crystallinity and a mirror-like surface morphology were obtained by using both a two-step growth process at the beginning of the InP buffer layer growth and several series of thermal cycle annealing throughout the InP buffer layer growth. Second, results of fabricated GaInAs/InP QWIPs on Si substrate are presented. At a temperature of 80 K, the peak response wavelength occurs at 7.4 μm. The responsivities of QWIPs on both Si and InP substrates with identical structures are equal up to biases of 1.5 V. At a bias of 3 V, the responsivity of the QWIPs on Si substrate is 1.0 A/W. [reprint (PDF)]
14.	Thermal imaging based on high-performance InAs/InP quantum-dot infrared photodetector operating at high temperature M. Razeghi; H. Lim; S. Tsao; H. Seo; W. Zhang Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS.15-16:[4382251] (2007).-- October 21, 2007 ...[Visit Journal] We report a room temperature operating and high-performance InAs quantum-dot infrared photodetector on InP substrate and thermal imaging of 320times256 focal plane array based on this device up to 200 K. [reprint (PDF)]
14.	Ultraviolet Detectors for AstroPhysics Present and Future M. Ulmer, M. Razeghi, and E. Bigan Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 239-- February 6, 1995 ...[Visit Journal] Astronomical instruments for the study of UV astronomy have been developed for NASA missions such as the Hubble Space Telescope. The systems that are `blind to the visible' (`solar-blind') yet sensitive to the UV that have been flown in satellites have detective efficiencies of about 10 to 20%, although typically electron bombardment charge coupled devices are higher at 30 - 40% and ordinary CCDs achieve 1 - 5%. Therefore, there is a large payoff still to be gained by further improvements in the performance of solar blind UV detectors. We provide a brief review of some aspects of UV astronomy, UV detector development, and possible technologies for the future. We suggest that a particularly promising future technology is one based on the ability of investigators to produce high quality films made of wide bandgap III-V semiconductors. [reprint (PDF)]
14.	Graphene versus oxides for transparent electrode applications Sandana, V. E.; Rogers, D. J.; Teherani, F. Hosseini; Bove, P.; Razeghi, M. Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862603 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] Due to their combination of good electrical conductivity and optical transparency, Transparent Conducting Oxides (TCOs) are the most common choice as transparent electrodes for optoelectronics applications. In particular, devices, such as LEDs, LCDs, touch screens and solar cells typically employ indium tin oxide. However, indium has some significant drawbacks, including toxicity issues (which are hampering manufacturing), an increasing rarefication (due to a combination of relative scarcity and increasing demand [1]) and resulting price increases. Moreover, there is no satisfactory option at the moment for use as a p-type transparent contact. Thus alternative materials solutions are actively being sought. This review will compare the performance and perspectives of graphene with respect to TCOs for use in transparent conductor applications. [reprint (PDF)]
14.	Comparison of PLD-Grown p-NiO/n-Ga2O3 Heterojunctions on Bulk Single Crystal β-Ga2O3 and r-plane Sapphire Substrates D. J. Rogers , V. E. Sandana, F. Hosseini Teherani and M. Razeghi Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 128870J (28 January - 1 February 2024 San Francisco)doi: 10.1117/12.3012511 ...[Visit Journal] p-NiO/n-Ga2O3 heterostructures were formed on single crystal (-201) β (monoclinic) Ga2O3 and r-sapphire substrates by Pulsed Laser Deposition. Ring mesa layer stacks were created using a shadow mask during growth. X-Ray diffraction studies were consistent with the formation of (111) oriented fcc NiO on the bulk Ga2O3 and randomly oriented fcc NiO on (102) oriented β-Ga2O3 /r-sapphire. RT optical transmission studies revealed bandgap energy values of ~3.65 eV and ~5.28 eV for the NiO and Ga2O3 on r-sapphire. p-n junction devices were formed by depositing gold contacts on the layer stacks using shadow masks in a thermal evaporator. Both heterojunctions showed rectifying I/V characteristics. On bulk Ga2O, the junction showed a current density over 16mA/cm2 at +20V forward bias and a reverse bias leakage current over 3 orders of magnitude lower at -20V (1 pA). On Ga2O3/r-sapphire the forward bias current density at +15V was about an order of magnitude lower than for the p-NiO/bulk n-Ga2O3 heterojunction while the reverse bias leakage current at -15V (~ 20 pA) was an order of magnitude higher. Hence the NiO/bulk Ga2O3 junction was more rectifying. Upon illumination with a Xenon lamp a distinct increase in current was observed for the IV curves in both devices (four orders of magnitude for -15V reverse bias in the case of the p-NiO/bulk n-Ga2O3 heterojunction). The p-NiO/n-Ga2O3/rsapphire junction gave a spectral responsivity with a FWHM value of 80nm and two distinct response peaks (with maxima at 230 and 270nm) which were attributed to carriers being photogenerated in the Ga2O3 underlayer. For both devices time response studies showed a 10%/90% rise and fall of the photo generated current upon shutter open and closing which was relatively abrupt (millisecond range), and there was no evidence of significant persistent photoconductivity. [reprint (PDF)]
14.	Characteristics of Self-Assembled InGaAs/InGaP Quantum Dot Mid-Infrared Photoconductive Detectors Grown by Low Pressure MOCVD S. Kim, M. Erdtmann, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the first self-assembled InGaAs/InGaP quantum dot intersubband infrared photoconductive detectors (QDIPs) grown on semi-insulating GaAs substrate by low pressure metal organic chemical vapor deposition (MOCVD). The InGaAs quantum dots were constructed on an InGaP matrix as self assembling in Stranski-Krastanow growth mode in optimum growth conditions. The detector structure was prepared for single layer and multi-stacked quantum dots for active region. Normal incident photoconductive response was observed at a peak wavelength of 5.5 μm with a high responsivity of 130 mA/W, and a detectivity of 4.74 X 10⁷ cm·Hz^½/W at 77 K for multi-stack QDIP. Low temperature photoresponse of the single quantum dot photodetector was characterized. Peak response was obtained between 16 K and 60 K. The detailed dark current noise measurements were carried on single and multistack quantum dot infrared detectors. High photoconductive gain as 7.6 x 10³ biased at 0.5 V results in increasing the intersubband carrier relaxation time as two order of magnitude compared quantum well infrared photodetectors. [reprint (PDF)]

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