Center for Quantum Devices - Most Downloaded Journal Articles

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3.	-- November 30, 1999
3.	Al_xGa_1-xN for Solar-Blind UV Detectors P. Sandvik, K. Mi, F. Shahedipour, R. McClintock, A. Yasan, P. Kung, and M. Razeghi Journal of Crystal Growth 231 (2001)-- January 1, 2001 ...[Visit Journal] We report on the metalorganic chemical vapor deposition of high quality AlGaN thin films on sapphire substrates over a wide range of Al concentrations. The quality of these AlGaN materials was verified through a demonstration of high performance visible and solar-blind UV p–i–n photodiodes with peak cutoff wavelengths ranging from 227 to 364 nm. External quantum efficiencies for these devices reached as high as 69% with over five orders rejection ratio from the peak to visible wavelengths. [reprint (PDF)]
3.	Study of Au coated ZnO nanoarrays for surface enhanced Raman scattering chemical sensing Gre´gory Barbillon, Vinod E. Sandana,Christophe Humbert, Benoit Be´lier, David J. Rogers, Ferechteh H. Teherani, Philippe Bove Ryan McClintock and Manijeh Razeghid J. Mater. Chem. C, 2017, 5, 3528-- March 20, 2017 ...[Visit Journal] At present, the simultaneous attainment of good reproducibility and high enhancement factors (EF) are key challenges in the development of surface enhanced Raman scattering (SERS)substrates for improved chemical and biological sensing. SERS substrates are generally based on distributions of metallic nanoparticles/structures with different shapes and architectures which are prepared by either thermal dewetting, precipitation from colloidal suspensions1–4 or advanced (e.g. deep UV or electron beam (EBL)) lithographic techniques.5–9 Although such substrates can exhibit large Raman enhancements, the former two techniques (colloidal and thermal dewetting) give poor SERS reproducibility while deep UV and EBL are too expensive and/or complex for mass production.
2.	-- November 30, 1999
2.	Engineering of the fermi level in PLD-grown NiO thin films by post-annealing D. Rogers*, E. Sandana, M. Chamberlin, F. Teherani; V. Safarov, M. Konczykowski, R. Grasset, A. Alessi, H. Drouhin ; M. Razeghi We investigate practical routes to engineer the Fermi level—and thus the effective work function—of p-type nickel oxide (NiO) thin films grown on c-sapphire by plasma-assisted pulsed laser deposition (PA-PLD) at room temperature (RT). We examine three levers: (i) oxygen-rich growth at low substrate temperature, (ii) post-deposition annealing in air or oxygen across 320–620 °C, and (iii) impurity (Li) acceptor doping. RT-grown NiO exhibits high crystalline quality with (111) out-of-plane orientation, narrow rocking-curve width, and a film thickness near 60 nm. RT epitaxy yields the lowest resistivity among the studied conditions, and resistance increases progressively with temperature for iso-chronic post-annealing in air. Oxygen ambient post-annealing shows no distinctive monotonic trend in resistivity, although the conductivity falls off for annealing over about 500°C. Optical transmission spectra suggest progressive healing of in-gap defect states with post-annealing temperature. Doping NiO with 20at% of Li lowers resistivity relative to undoped NiO by an order of magnitude. Post-annealing at 300°C under oxygen ambient significantly boosts conductivity. Over a decade of storage, all films exhibited significant loss of conductivity, underscoring the need for stabilisation strategies. The results map practical processing windows to tune the NiO Fermi level for integration in oxide heterojunctions (e.g., p-NiO/n-Ga2O3) used in ultraviolet detection and wide-bandgap electronics.
2.	Room Temperature Epitaxy of Ni1−xMgxO on c Plane Sapphire by Plasma Assisted Pulsed Laser Deposition David J. Rogers, Eric V. Sandana, Ferechteh H. Teherani, M. Razeghi physica status solidi (b) 2026, 263 (7), e202500648. ...[Visit Journal] This paper reports on room-temperature (RT) epitaxial growth of NiO and Ni1-xMgxO (x ≈ 0.50) thin films on c-plane sapphire (0001) using plasma-assisted pulsed laser deposition. Optical transmission reveals absorption edges at ~3.6 eV (NiO) and ~4.4 eV (Ni0.5Mg0.50O), confirming bandgap engineering via Mg incorporation consistent with prior alloy data. X-ray reflectivity (XRR) indicates smooth surfaces and thicknesses of ~60 nm (NiO) and ~65 nm (Ni0.5Mg0.50O). High-resolution X-ray diffraction 2θ/ω scans indicate fcc (111) orientation for both films; ω-rocking curves exhibit full width half maxima of 0.07°—remarkably low mosaic spread for RT-grown oxides. (002) pole figures display six-fold symmetry, evidencing epitaxial relationships featuring two rotational domains (±60°) about [111] on c-sapphire. AFM (1 µm × 1 µm) yields root mean square roughness of ~0.5 nm (NiO) and ~2.6 nm (Ni0.5Mg0.50O). Four-point probe gives ρ ≈ 26 Ω·cm (NiO) and insulating behavior for Ni0.5Mg0.50O, consistent with bandgap widening and reduced hole concentration. These results establish RT epitaxial Mg-alloyed NiO with exceptional crystallinity, directly relevant to Ga2O3 heterojunctions for power electronics and solar-blind ultra violet C-band photodetectors, where tunable band alignment and sharp interfaces are critical.
1.	-- November 30, 1999

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