Center for Quantum Devices - Most Downloaded Journal Articles

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10.	High-performance, continuous-wave quantum-cascade lasers operating up to 85° C at λ ~ 8.8 μm J.S. Yu, S. Slivken, A. Evans, and M. Razeghi Applied Physics A: Materials Science & Processing, Vo. 93, No. 2, p. 405-408-- November 1, 2008 ...[Visit Journal] High-temperature, high-power, and continuous-wave (CW) operation of quantum-cascade lasers with 35 active/injector stages at λ∼8.85 μm above room temperature is achieved without using a buried heterostructure. At this long wavelength, the use of a wider ridge waveguide in an epilayer-down bonding scheme leads to a superior performance of the laser. For a high-reflectivity-coated 21 μm×3 mm laser, the output power of 237 mW and the threshold current density of 1.44 kA·cm^-2 at 298 K under CW mode are obtained with a maximum wall-plug efficiency of 1.7%. Further improvements were observed by using a 4-mm-long cavity. The device exhibits 294 mW of output power at 298 K and it operates at a high temperature, even up to 358 K (85°C). The full widths at half-maximum of the laser beam in CW operation for the parallel and the perpendicular far-field patterns are 25°and 63°, respectively. [reprint (PDF)]
10.	High-power high-wall plug efficiency mid-infrared quantum cascade lasers based on InP/GaInAs/InAlAs material system M. Razeghi SPIE Proceedings, San Jose, CA Volume 7230-11-- January 26, 2009 ...[Visit Journal] The latest result at the Center for Quantum Devices about high power, high wall plug efficiency, mid-infrared quantum cascade lasers (QCLs) is presented. At an emitting wavelength of 4.8 µm, an output power of 3.4 W and a wall plug efficiency of 16.5% are demonstrated from a single device operating in continuous wave at room temperature. At a longer wavelength of 10.2 µm, average power as high as 2.2 W is demonstrated at room temperature. Gas-source molecular beam epitaxy is used to grow the QCL core in an InP/GaInAs/InAlAs material system. Fe-doped semiinsulating regrowth is performed by metal organic chemical vapor deposition for efficient heat removal and low waveguide loss. This accomplishment marks an important milestone in the development of high performance midinfrared QCLs. [reprint (PDF)]
10.	On the performance and surface passivation of type-II InAs/GaSb superlattice photodiodes for the very-long- wavelength infrared A. Hood, M. Razeghi, E. Aifer, G.J. Brown Applied Physics Letters 87 (1)-- October 10, 2005 ...[Visit Journal] We demonstrate very-long-wavelength infrared Type-II InAs/GaSb superlattice photodiodes with a cutoff wavelength (λ_c,50%) of 17 μm. We observed a zero-bias, peak Johnson noise-limited detectivity of 7.63×10⁹ cm·Hz^½/W at 77 K with a 90%-10% cutoff width of 17 meV, and quantum efficiency of 30%. Variable area diode zero-bias resistance-area product (R₀A) measurements indicated that silicon dioxide passivation increased surface resistivity by nearly a factor of 5, over unpassivated photodiodes, and increased overall R₀A uniformity. The bulk R₀A at 77 K was found to be 0.08 Ω·cm², with RA increasing more than twofold at 25 mV reverse bias. [reprint (PDF)]
10.	Radiometric characterization of long-wavelength infrared type II strained layer superlattice focal plane array under low-photon irradiance conditions J. Hubbs, V. Nathan, M. Tidrow, and M. Razeghi Optical Engineering, Vol. 51, No. 6, p. 064002-1-- June 15, 2012 ...[Visit Journal] We present the results of the radiometric characterization of an “M” structure long wavelength infrared Type-II strained layer superlattice(SLS) infrared focal plane array (IRFPA) developed by Northwestern University (NWU). The performance of the M-structure SLS IRFPA was radiometrically characterized as a function of photon irradiance, integration time, operating temperature, and detector bias. Its performance is described using standard figures of merit: responsivity, noise, and noise equivalent irradiance. Assuming background limited performance operation at higher irradiances, the detector quantum efficiency for the SLS detector array is approximately 57%. The detector dark density at 80 K is 142 μA∕cm², which represents a factor of seven reduction from previously measured devices. [reprint (PDF)]
10.	Responsivity and Noise Performance of InGaAs/InP Quantum Well Infrared Photodetectors C. Jelen, S. Slivken, T. David, G. Brown, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] Dark current nose measurements were carried out between 10 and 104 Hz at T = 80K on two InGaAs/InP quantum well IR photo detectors (QWIPs) designed for 8 μm IR detection. Using the measured noise data, we have calculated the thermal generation rate, bias-dependent gain, electron trapping probability, and electron diffusion length. The calculated thermal generation rate is similar to AlGaAs/GaAs QWIPs with similar peak wavelengths, but the gain is 50X larger, indicating improved transport and carrier lifetime are obtained in the binary InP barriers. As a result, a large responsivity of 7.5 A/W at 5V bias and detectivity of 5 X 10¹¹ cm·Hz^½/W at 1.2 V bias were measured for the InGaAs/InP QWIPs at T = 80K. [reprint (PDF)]
10.	High Performance Planar Antimony-Based Superlattice Photodetectors Using Zinc Diffusion Grown by MBE Jiakai Li, R. K. Saroj, Steven Slivken, V. H. Nguyen, Gail Brown and Manijeh Razeghi Photonics 2022, 9, 664 ...[Visit Journal] In this letter, we report a mid-wavelength infrared (MWIR) planar photodetector based on InAs/InAsSb type-II superlattices (T2SLs) that has a cut-off wavelength of 4.3 um at 77 K. The superlattice for the device was grown by molecular beam epitaxy while the planar device structure was achieved by Zinc diffusion process in a metal–organic chemical vapor deposition reactor. At 77 K, the peak responsivity and the corresponding quantum efficiency had the value of 1.42 A/W and 48% respectively at 3.7 um under -20 mV for the MWIR planar photodetector. At 77 K, the MWIR planar photodetector exhibits a dark current density of 2.0E5 A/cm^2 and the R0A value of ~3.0E2 Ohm cm^2 under -20 mV, which yielded a specific detectivity of 4.0E11 cm Hz^(1/2)/W at 3.7 um. At 150 K, the planar device showed a dark current density of 6.4E-5 A/cm^2 and a quantum efficiency of 49% at ~3.7 um under -20 mV, which yielded a specific detectivity of 2.0E11 cm Hz^(1/2)/W. [reprint (PDF)]
10.	Stable single mode terahertz semiconductor sources at room temperature M. Razeghi 2011 International Semiconductor Device Research Symposium, ISDRS [6135180] (2011).-- December 7, 2011 ...[Visit Journal] Terahertz (THz) range is an area of the electromagnetic spectra which has lots of applications but it suffers from the lack of simple working devices which can emit THz radiation, such as the high performance mid-infrared (mid-IR) quantum cascade lasers (QCLs) based on InP technology. The applications for the THz can be found in astronomy and space research, biology imaging, security, industrial inspection, etc. Unlike THz QCLs based on the fundamental oscillators, which are limited to cryogenic operations, semiconductor THz sources based on nonlinear effects of mid-IR QCLs do not suffer from operating temperature limitations, because mid-IR QCLs can operate well above room temperature. THz sources based on difference frequency generation (DFG) utilize nonlinear properties of asymmetric quantum structures, such as QCL structures. [reprint (PDF)]
10.	Very Long Wavelength Infrared Type-II Detectors Operating at 80K H. Mohseni, A. Tahraoui, J. Wojkowski, M. Razeghi, G.J. Brown, W.C. Mitchel, and Y.S. Park Applied Physics Letters 77 (11)-- September 11, 2000 ...[Visit Journal] We report a demonstration of very long wavelength infrared detectors based on InAs/GaSb superlattices operating at T = 80 K. Detector structures with excellent material quality were grown on an optimized GaSb buffer layer on GaAs semi-insulating substrates. Photoconductive devices with 50% cutoff wavelength of λ_c = 17 μm showed a peak responsivity of about 100 mA/W at T = 80 K. Devices with 50% cutoff wavelengths up to λ_c = 22 μm were demonstrated at this temperature. Good uniformity was obtained over large areas even for the devices with very long cutoff wavelengths. [reprint (PDF)]
10.	Optical losses of Al-free lasers for λ = 0.808 and 0.98 μm H. Yi, J. Diaz, B. Lane, and M. Razeghi Applied Physics Letters 69 (20)-- November 11, 1996 ...[Visit Journal] In this work, we study the origin of the optical losses in Al‐free InGaAsP/GaAs (λ=0.808 μm) and InGaAs/GaAs/InGaP (λ=0.980 μm) lasers. Theoretical modeling and the experimental results indicate that the scattering of the laser beam by refractive index fluctuation in the alloys is the dominant loss in our lasers, and the loss due to the free‐carrier absorption and scattering by interface roughness are negligible. [reprint (PDF)]
10.	Solar-blind AlGaN photodiodes with very low cutoff wavelength D. Walker, V. Kumar, K. Mi, P. Sandvik, P. Kung, X.H. Zhang, and M. Razeghi Applied Physics Letters 76 (4)-- January 24, 2000 ...[Visit Journal] We report the fabrication and characterization of AlxGa1–xN photodiodes (x~0.70) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The peak responsivity for –5 V bias is 0.11 A/W at 232 nm, corresponding to an internal quantum efficiency greater than 90%. The device response drops four orders of magnitude by 275 nm and remains at low response for the entire near-ultraviolet and visible spectrum. Improvements were made to the device design including a semitransparent Ni/Au contact layer and a GaN:Mg cap layer, which dramatically increased device response by enhancing the carrier collection efficiency. [reprint (PDF)]
10.	p-Type thin film field effect transistors based on lithium-doped nickel oxide channels grown by pulsed laser deposition V. E. Sandana; D. J. Rogers; F. H. Teherani; P. Bove; R. McClintock; M. Razeghi SPIE Proceedings Volume 10919, Oxide-based Materials and Devices X; 109191H -- March 12, 2019 ...[Visit Journal] Staggered back-gated Field Effect Transistor (FET) structures were made by growing Li-doped NiO on Si₃N₄/SiO₂/Si (111) using room temperature pulsed laser deposition. Optical studies showed over 80% transmission for the NiO:Li channel at wavelengths > 500nm. The MISFET revealed rectifying transfer characteristics, with a V_ON close to zero, a channel mobility of ~ 1 cm²/V·s, a gate leakage current (at +5V) of 0.8 mA and an ION/IOFF ratio (at a Vgs of −15V) of ~ 10³. The transistors showed enhancement-mode output characteristics indicative of a p-type channel with sharp pinchoff, hard saturation, a comparatively high (milliampere range) Id and a relatively low on-resistance of ~11 kΩ. Hence the adoption of Li doping in NiO channels would appear to be a promising approach to obtain p-type TFTs with superior transparency, speed and energy efficiency. [reprint (PDF)]
10.	High-power laser diodes based on InGaAsP alloys M. Razeghi Nature, Vol.369, p.631-633-- June 23, 1994 ...[Visit Journal] HIGH-POWER, high-coherence solid-state lasers, based on dielectric materials such as ruby or Nd:YAG (yttrium aluminium garnet), have many civilian and military applications. The active media in these lasers are insulating, and must therefore be excited (or ‘pumped’) by optical, rather than electrical, means. Conventional gas-discharge lamps can be used as the pumping source, but semiconductor diode lasers are more efficient, as their wavelength can be tailored to match the absorption properties of the lasing material. Semiconducting AlGaAs alloys are widely used for this purpose, but oxidation of the aluminium and the spreading of defects during device operation limit the lifetime of the diodes3, and hence the reliability of the system as a whole. Aluminium-free InGaAsP compounds, on the other hand, do not have these lifetime-limiting properties. We report here the fabrication of high-power lasers based on InGaAsP (lattice-matched to GaAs substrates), which operate over the same wavelength range as conventional AlGaAs laser diodes and show significantly improved reliability. The other optical and electrical properties of these diodes are either comparable or superior to those of the AlGaAs system. [reprint (PDF)]
10.	Gain-length scaling in quantum dot/quantum well infrared photodetectors T. Yamanaka, B. Movaghar, S. Tsao, S. Kuboya, A. Myzaferi and M. Razeghi Applied Physics Letters, Vol. 95, No. 9-- August 31, 2009 ...[Visit Journal] The gain in quantum dot/quantum well infrared photodetectors is investigated. The scaling of the gain with device length has been analyzed, and the behavior agrees with the previously proposed model. We conclude that we understand the gain in the low bias region, but in the high field region, discrepancies remain. An extension of the gain model is presented to cover the very high electric field region. The high field data are compared to the extended model and discussed. [reprint (PDF)]
10.	High performance GaAs/GaInP heterostructure bipolar transistors grown by low-pressure metal-organic chemical vapour deposition M Razeghi, F Omnes, M Defour, P Maurel, J Hu, E Wolk and D Pavlidis M Razeghi et al 1990 Semicond. Sci. Technol. 5 278-- December 11, 1989 ...[Visit Journal] The authors report the fabrication of high-quality GaAs/GaInP n-p-n heterojunction bipolar transistors grown by low-pressure metal-organic chemical vapour deposition on semi-insulating substrates. Various structures with homogeneous and graded bases have been fabricated. Doping profiles together with X-ray double diffraction patterns demonstrate the excellent control of growth parameters such as thicknesses, doping levels and interface quality. The static characteristics of the devices show current gains as high as 400, which is the highest value reported in that system [reprint (PDF)]
10.	Advanced Monolithic Quantum Well Infrared Photodetector Focal Plane Array Integrated with Silicon Readout Integrated Circuit J. Jiang, S. Tsao, K. Mi, M. Razeghi, G.J. Brown, C. Jelen and M.Z. Tidrow Infrared Physics and Technology, 46 (3)-- January 1, 2005 ...[Visit Journal] Today, most infrared focal plane arrays (FPAs) utilize a hybrid scheme. To achieve higher device reliability and lower cost, monolithic FPAs with Si based readout integrated circuits (ROICs) are the trend of the future development. In this paper, two approaches for monolithic FPAs are proposed: double sided integration and selective epitaxy integration. For comparison, the fabrication process for hybrid quantum well infrared photodetectors (QWIP) FPAs are also described. Many problems, such as the growth of QWIPs on Si substrate and processing incompatibility between Si and III–V semiconductors, need to be solved before monolithic FPAs can be realized. Experimental work on GaInAs/InP QWIP-on-Si is given in this paper. A record high detectivity of 2.3×10⁹ jones was obtained for one QWIP-on-Si detector at 77 K. [reprint (PDF)]
10.	Exciton localization in group-III nitride quantum wells V.I. Litvinov and M. Razeghi Physical Review B 59 (15)-- May 15, 1999 ...[Visit Journal] Exciton density of states broadened by compositional disorder in the group-III nitride quantum well is calculated. The excitonic photoluminescence linewidth is estimated and related to the material parameters of the alloy for two limiting cases of two-dimensional (2D) and three-dimensional excitons in the quantum well. It is shown that the effect of the compositional fluctuations depends on dimensionality of the exciton: the 2D excitons are more sensitive to the inhomogeneities than 3D ones. The broad near-band-gap energy states distribution for quasi-two-dimensional excitons is consistent with the experimental evidence of the spontaneous and stimulated emissions from excitonic states localized on compositional fluctuations. [reprint (PDF)]
10.	A Review of III-Nitride Research at the Center for Quantum Devices M. Razeghi and R. McClintock Journal of Crystal Growth, Vol. 311, No. 10-- May 1, 2009 ...[Visit Journal] In this paper, we review the history of the Center for Quantum Devices’ (CQD) III-nitride research covering the past 15 years. We review early work developing III-nitride material growth. We then present a review of laser and light-emitting diode (LED) results covering everything from blue lasers to deep UV LEDs emitting at 250 nm. This is followed by a discussion of our UV photodetector research from early photoconductors all the way to current state of the art Geiger-mode UV single photon detectors. [reprint (PDF)]
10.	Investigations of ZnO thin films grown on c-Al(2)O(3) by pulsed laser deposition in N(2) + O(2) ambient D.J. Rogers, D.C. Look, F.H. Teherani, K. Minder, M. Razeghi, A. Largeteau, G. Demazeau, J. Morrod, K.A. Prior, A. Lusson, and S. Hassani Physica Status Solidi (c), Vol. 5, No. 9, p. 3084-3087-- July 1, 2008 ...[Visit Journal] ZnO films were deposited on c-Al₂O₃ using pulsed laser deposition both with and without N₂ in the growth ambient. X-ray diffraction revealed poorer crystal quality and surface morphology for one-step growths with N₂ in the ambient. A marked improvement in both the crystallographic and surface quality was obtained through use of two-step growths employing nominally undoped ZnO buffer layers prior to growth with N₂ in the ambient. All films showed majority n-type conduction in Hall measurements. Post-annealing for 30 minutes at 600 ºC in O₂ systematically reduced both the carrier concentration and the conductivity. A base room temperature carrier concentration of ~ 10¹⁶ cm^-3 was linked to Al diffusing from the substrate. 4.2 K photoluminescence spectra exhibited blue bands associated with the growths having N₂ in the ambient. Temperature dependent Hall measurements were consistent with N being incorporated in the films. Processed devices did not, however, show rectifying behavior or electroluminescence. [reprint (PDF)]
10.	Electron capture processes in optically excited In0.53Ga 0.47As/InP quantum wells U. Cebulla, G. Bacher, A. Forchel, D. Schmitz, H. Jürgensen, M. Razeghi Appl. Phys. Lett. 55, 933–935 (1989)-- September 4, 1989* ...[Visit Journal] We have performed picosecond time-resolved measurements on Ir:.O. 53 GaO. 47 As/lnP quantum wells with varying barrier thicknesses using 10 ps Nd:Y AG excitation. For this excitation, holes and electrons are created in the Ino . 53 GaOA7 As layers. Due to momentum conservation the Nd:YAG excitation accelerates the electrons above the InP barrier where they can diffuse but cannot recombine. By examining the rise time of the quantum well emission, we can show that for samples with thick barriers, the harrier geometry largely controls the dynamic properties of the carriers after Nd:YAG excitation. [reprint (PDF)]
10.	High performance quantum cascade lasers (~11 μm) operating at high temperature (T>= 425K) A. Tahraoui, A. Matlis, S. Slivken, J. Diaz, and M. Razeghi Applied Physics Letters 78 (4)-- January 22, 2001 ...[Visit Journal] We report record-low threshold current density and high output power for λ ∼ 11 μm Al_0.48In_0.52As/Ga_0.47In_0.53As quantum cascade lasers operating up to 425 K. The threshold current density is 1.1, 3.83, and 7.08 kA/cm² at 80, 300, and 425 K, respectively, for 5 μs pulses at a 200 Hz repetition rate. The cavity length is 3 mm with a stripe width of 20 μm. The maximum peak output power per facet is 1 W at 80 K, 0.5 W at 300 K, and more than 75 mW at 425 K. The characteristic temperature of these lasers is 174 K between 80 and 300 K and 218 K in the range of 300–425 K. [reprint (PDF)]
10.	Ga₂O₃ Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 ...[Visit Journal] Si-doped gallium oxide (Ga₂O₃) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga₂O₃ MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~10⁸. These transistor characteristics were stable from room temperature to 250 °C [reprint (PDF)]
10.	EPR Study of Gd around the Ferroelastic Transition Point of Pb3 (PO4)2 M. RAZEGHI and B. HOULIER M. RAZEGHI et al., phys. stat. sol. (b) 89, K135 (1978) -- October 1, 1978 ...[Visit Journal][reprint (PDF)]
10.	*High quality AlN and GaN epilayers grown on (001) sapphire, (100) and (111) silicon substrates P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi Applied Physics Letters 66 (22)-- May 29, 1995** ...[Visit Journal] The growth of high quality AlN and GaN thin films on basal plane sapphire, (100), and (111) silicon substrates is reported using low pressure metalorganic chemical vapor deposition. X-ray rocking curve linewidths of about 100 and 30 arcsec were obtained for AlN and GaN on sapphire, respectively. Room‐temperature optical transmission and photoluminescence (of GaN) measurements confirmed the high quality of the films. The luminescence at 300 and 77 K of the GaN films grown on basal plane sapphire, (100), and (111) silicon was compared. [reprint (PDF)]
10.	Passivation of Type-II InAs/GaSb superlattice photodetectors A. Hood, Y. Wei, A. Gin, M. Razeghi, M. Tidrow, and V. Nathan SPIE Conference, Jose, CA, Vol. 5732, pp. 316-- January 22, 2005 ...[Visit Journal] Leakage currents limit the operation of high performance Type-II InAs/GaSb superlattice photodiode technology. Surface leakage current becomes a dominant limiting factor, especially at the scale of a focal plane array pixel (< 25 µm) and must be addressed. A reduction of the surface state density, unpinning the Fermi level at the surface, and appropriate termination of the semiconductor crystal are all aims of effective passivation. Recent work in the passivation of Type-II InAs\GaSb superlattice photodetectors with aqueous sulfur-based solutions has resulted in increased R₀A products and reduced dark current densities by reducing the surface trap density. Additionally, photoluminescence of similarly passivated Type-II InAs/GaSb superlattice and InAs GaSb bulk material will be discussed. [reprint (PDF)]
10.	Structural and compositional characterization of MOVPE GaN thin films transferred from sapphire to glass substrates using chemical lift-off and room temperature direct wafer bonding and GaN wafer scale MOVPE growth on ZnO-buffered sapphire S. Gautier, T. Moudakir, G. Patriarche, D.J. Rogers, V.E. Sandana, F. Hosseini Teherani, P. Bove, Y. El Gmili, K. Pantzas, Suresh Sundaram, D. Troadec, P.L. Voss, M. Razeghi, A. Ougazzaden Journal of Crystal Growth, Volume 370, Pages 63-67 (2013)-- May 1, 2013 ...[Visit Journal] GaN thin films were grown on ZnO/c-Al₂O₃ with excellent uniformity over 2 in. diameter wafers using a low temperature/pressure MOVPE process with N₂ as a carrier and dimethylhydrazine as an N source. 5 mm×5 mm sections of similar GaN layers were direct-fusion-bonded onto soda lime glass substrates after chemical lift-off from the sapphire substrates. X-Ray Diffraction, Scanning Electron Microscopy and Transmission Electron Microscopy confirmed the bonding of crack-free wurtzite GaN films onto a glass substrate with a very good quality of interface, i.e. continuous/uniform adherence and absence of voids or particle inclusions. Using this approach, (In) GaN based devices can be lifted-off expensive single crystal substrates and bonded onto supports with a better cost-performance profile. Moreover, the approach offers the possibility of reclaiming the expensive sapphire substrate so it can be utilized again for growth. [reprint (PDF)]

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